NSF funded Sheldon Tan's research on physics-based VLSI reliability modeling and management
Dr. Sheldon Tan's research project for developing novel electromigration analysis and modeling techniques has been funded by National Science Foundation (NSF). The new research project (CCF-1527324) is titled "SHF:Small: Physics-Based Electromigration Assessment and Validation For Reliability-Aware Design and Management”. The new funding will support the EM related research at VSCLAB for three years starting August of 2015. See the related ECE newsVSLCAB lab has made a number of new contributions along with our industry collaborator Dr. Valeriy Sukharev in the past a few year on new EM modeling and assessment techniques for nanometer VLSI chips.EM and long term reliability is the major design challenges for sub-10nm VLSI chips. We have developed a new physics-based EM model and full-chip IR-based EM assessment technique to reduce the over-conservation of existing EM sign-off techniques. The new EM model and assessment techniques will have significant impacts on the VLSI design and design tool development communities. UCR is now leading the EM and reliability related research in the world. The new funding will further boost EM and other long-term reliability research works at UCR.